Sparse sampling and reconstruction for electron and scanning probe microscope imaging
| DWPI Title: Method for conducting electron or scanning probe microscopy, involves processing data collected by detectors from visits of electron beam or probe at actual pixel locations and recovering reconstructed image of sample |
| Abstract: Systems and methods for conducting electron or scanning probe microscopy are provided herein. In a general embodiment, the systems and methods for conducting electron or scanning probe microscopy with an undersampled data set include: driving an electron beam or probe to scan across a sample and visit a subset of pixel locations of the sample that are randomly or pseudo-randomly designated; determining actual pixel locations on the sample that are visited by the electron beam or probe; and processing data collected by detectors from the visits of the electron beam or probe at the actual pixel locations and recovering a reconstructed image of the sample. |
| Use: Method for conducting electron or scanning probe microscopy such as atomic force microscopes (AFM) and scanning tunneling microscope of nanometer microscopy. |
| Advantage: The speed up of image acquisition by about two times or greater is achieved while providing smooth images in which the electron probe measures one-at-a-time a randomly-selected subset of the pixel locations. The natural user interface can rely on speech recognition, touch and stylus recognition, gesture recognition both on screen and adjacent to the screen, air gestures, head and eye tracking, voice and speech, vision, touch, gestures, and machine intelligence. The determiner component is configured to determine actual pixel locations on the sample area that are visited by the electron beam, and a reconstruction component is configured to process data collected by detectors from the visits of the electron beam at the actual pixel locations and recover a reconstructed image from the processed data. |
| Novelty: The method involves driving (215) an electron beam or probe to scan across a sample and visiting a subset of pixel locations of the sample that are randomly or pseudo-randomly designated. The actual pixel locations are determined (220) on the sample that are visited by the electron beam or probe. The data collected by detectors from the visits of the electron beam or probe at the actual pixel locations is processed (235) and a reconstructed image of the sample is recovered. |
| Filed: 9/10/2014 |
| Application Number: US14482754A |
| Tech ID: SD 12449.1 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
| Data from Derwent World Patents Index, provided by Clarivate All rights reserved. Republication or redistribution of Clarivate content, including by framing or similar means, is prohibited without the prior written consent of Clarivate. Clarivate and its logo, as well as all other trademarks used herein are trademarks of their respective owners and used under license. |