PHOTOLITHOGRAPHY OF ATOMIC LAYER RESIST
| Patent Number: | 11,424,135 |
| Issued: | 8/23/2022 |
| Official Filing: | View the Complete Patent |
| Application Number: | 182,838/17 |
| Government Interests: | STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |