In-situ formation of nanoparticles within a silicon-based matrix
| DWPI Title: In-situ formation of nanoparticles within silicon-based matrix involves curing silicon-based matrix composite obtained by mixing silicon-based matrix solution and noncarbonyl inorganic nanoparticle precursor having anion of e.g sulfur |
| Abstract: A method for encapsulating nanoparticles with an encapsulating matrix that minimizes aggregation and maintains favorable properties of the nanoparticles. The matrix comprises silicon-based network-forming compounds such as ormosils and polysiloxanes. The nanoparticles are synthesized from precursors directly within the silicon-based matrix. |
| Use: For in-situ formation of nanoparticles within a silicon-based matrix (claimed). |
| Advantage: The method encapsulates nanoparticles with an encapsulating matrix that minimizes aggregation and maintains favorable properties of the nanoparticles. The nanoparticles are synthesized from precursors directly within the silicon-based matrix. |
| Novelty: In-situ formation of nanoparticles within a silicon-based matrix involves: mixing at least one noncarbonyl inorganic nanoparticle precursor, and at least one silicon-based matrix solution, to form a silicon-based matrix composite comprising several nanoparticles, where the at least one noncarbonyl inorganic nanoparticle precursor comprises an anion selected from S, Se and/or Te; and curing the silicon-based matrix composite. |
| Filed: 10/3/2005 |
| Application Number: US2005242274A |
| Tech ID: SD 7759.0 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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