Ultrathin layer photocatalysts

DWPI Title: Forming catalyst activated by electromagnetic radiation involves depositing semiconductor material on transparent ceramic substrate that has diameter that is larger than wavelength of electromagnetic radiation to cover ceramic substrate, and partially with photocatalyst layer
Abstract: A transparent ceramic substrate is covered by a photocatalyst layer, at least partially. The photocatalyst layer includes a semiconductor material that, upon exposure to electromagnetic radiation, forms a plurality of electrons and a plurality of holes that remain confined to the photocatalyst layer. The transparent ceramic substrate has a diameter that is larger than the wavelength of the electromagnetic radiation for light trapping.
Use: Method for forming catalyst activated by electromagnetic radiation.
Advantage: The resulting catalyst can exhibit an extremely high photocatalytic capability (i.e., greater than 1000 times higher than commercial semiconductor nanoparticles) for oxidizing organic compounds in water under the irradiation of ultraviolet light.
Novelty: Forming a catalyst activated by electromagnetic radiation involves depositing a semiconductor material on a transparent ceramic substrate that has a diameter that is larger than the wavelength of the electromagnetic radiation to cover the ceramic substrate, at least partially, with a photocatalyst layer, and exposing the semiconductor material to the electromagnetic radiation to produce a plurality of electrons and multiple of holes that remain confined to the photocatalyst layer.
Filed: 3/15/2024
Application Number: US18606360A
Tech ID: SD 13409.1
This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.
Data from Derwent World Patents Index, provided by Clarivate
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