Method of patterning an aerogel
| DWPI Title: Producing a pattern in an aerogel without use of photoresist, comprises etching the irradiated aerogel coating with an etchant |
| Abstract: A method for producing a pattern in an aerogel disposed as a coating on a substrate comprises exposing the aerogel coating to the vapors of a hydrophobic silane compound, masking the aerogel coating with a shadow photomask and irradiating the aerogel coating with ultraviolet (UV) irradiation. The exposure to UV through the shadow mask creates a pattern of hydrophobic and hydrophilic regions in the aerogel coating. Etching away the hydrophilic regions of the aerogel coating, preferably with a 1 molar solution of sodium hydroxide, leaves the unwetted and unetched hydrophobic regions of the aerogel layer on the substrate, replicating the pattern of the photomask. The hydrophobic aerogel pattern can be further exposed to UV irradiation if desired, to create a hydrophilic aerogel pattern. |
| Use: The method is used for producing a pattern in an aerogel without use of photoresist (claimed). |
| Advantage: The method allows patterning of aerogels that are very porous materials, with low refractive index, and are produced by sol-gel processing, preferably for etching sharply defined patterns in porous aerogel films disposed on a substrate. The methods overcome the limitations of irregularly edged features typically produced when traditional photolithographic methods are applied to porous materials. |
| Novelty: Producing a pattern in an aerogel without use of photoresist, comprises providing the aerogel as a coating disposed onto a substrate; exposing the aerogel coating to vapors of a silylating agent; placing a photomask comprising the pattern proximal to the aerogel coating; irradiating the photomask and the aerogel coating with UV illumination, such that the aerogel is irradiated with the pattern through the photomask; and etching the irradiated aerogel coating with an etchant, thus creating the pattern in the aerogel. |
| Filed: 6/8/2009 |
| Application Number: US2009480158A |
| Tech ID: SD 10789.0 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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