Preparation of asymmetric porous materials

DWPI Title: Preparing asymmetric microporous material, comprises depositing microporous material film on flexible substrate and applying anisotropic stress to flexible substrate, where the microporous material film is formed of e.g. silica
Abstract: A method for preparing an asymmetric porous material by depositing a porous material film on a flexible substrate, and applying an anisotropic stress to the porous media on the flexible substrate, where the anisotropic stress results from a stress such as an applied mechanical force, a thermal gradient, and an applied voltage, to form an asymmetric porous material.
Use: The process is useful for preparing an asymmetric microporous material.
Novelty: Preparing an asymmetric microporous material, comprises depositing a microporous material film on a flexible substrate, and applying an anisotropic stress to the flexible substrate, where the anisotropic stress results from a stress of an applied mechanical force, a thermal gradient or an applied voltage, to form an asymmetric porous material, where the microporous material film is formed of a majority of a material of silica, alumina, aluminosilicate or titania.
Filed: 7/29/2009
Application Number: US2009511095A
Tech ID: SD 11393.0
This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.
Data from Derwent World Patents Index, provided by Clarivate
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