Single crystal micromechanical resonator and fabrication methods thereof
| DWPI Title: Method for fabricating micromechanical resonator, involves removing ion damaged layer with etchant thereby releasing resonating portion of resonator from crystal and annealing resonator |
| Abstract: The present invention relates to a single crystal micromechanical resonator. In particular, the resonator includes a lithium niobate or lithium tantalate suspended plate. Also provided are improved microfabrication methods of making resonators, which does not rely on complicated wafer bonding, layer fracturing, and mechanical polishing steps. Rather, the methods allow the resonator and its components to be formed from a single crystal. |
| Use: Method for fabricating micromechanical resonator. |
| Advantage: The resonator can be optimized to promote symmetric modes. The wide range of filter frequencies can be achieved on a single wafer by altering the CAD-layout of the devices. |
| Novelty: The method involves providing a single crystal comprising lithium niobate or lithium tantalate. The exposed area of the single crystal with ions is treated thereby creating an ion damaged region below a top surface of the crystal. The trench (210) that defines a first dimension of the resonator is provided. The ion damaged layer with an etchant is removed thereby releasing a resonating portion of the resonator from the crystal and the resonator is annealed. |
| Filed: 5/27/2014 |
| Application Number: US14288236A |
| Tech ID: SD 12809.0 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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