Systems and methods for interferometric end point detection for a focused ion beam fabrication tool
| DWPI Title: System for detecting interferometric end point for focused ion beam fabrication tool, has computing device for outputting image of target based upon data, and outputting indication of thickness of layer of target based upon another data |
| Abstract: Various technologies for providing an operator of a focused ion beam (FIB) system with navigational and processing data are described herein. An exemplary system includes a broadband light source and a narrowband light source that emit light to a target of the FIB. An optical detector receives reflections of the broadband light from the target and outputs data that is used to generate two-dimensional images of the target in a region near a location of incidence of the FIB at the target. An interferometer receives reflections of the narrowband light from the target and outputs data indicative of an interference pattern of the narrowband reflections. A computing device computes a thickness of one or more material layers that make up the target based upon the interference pattern. A two-dimensional image of the target and an indication of the computed thickness are then displayed to the operator of the FIB. |
| Use: System for detecting an interferometric end point for a focused ion beam fabrication tool used in micro and nano-scale additive and subtractive processing. |
| Advantage: The system ensures that an IR image and thickness indication provide an operator of the system with in-situ information about the target for allowing the operator to accurately perform backside circuit processing operations, thus reducing fabrication errors. The system positions the focusing objective outside a vacuum chamber such that focusing objective can be repaired, modified, and replaced without requiring the operator to enter a sealed environment of the vacuum chamber. |
| Novelty: The system (500) has an optical detector e.g. infrared (IR) detector (112), for receiving reflection of first light from a target and to output first data indicative of intensity of the reflection of the first light received at the optical detector. An interferometer (114) receives reflection of second light from the target and to output second data indicative of an interference pattern of the reflection of the second light. A computing device (116) outputs an image of the target based upon the first data, and outputs indication of thickness of a layer in layers of the target based upon the second data. |
| Filed: 6/14/2017 |
| Application Number: US15623239A |
| Tech ID: SD 14067.0 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
| Data from Derwent World Patents Index, provided by Clarivate All rights reserved. Republication or redistribution of Clarivate content, including by framing or similar means, is prohibited without the prior written consent of Clarivate. Clarivate and its logo, as well as all other trademarks used herein are trademarks of their respective owners and used under license. |