Method of chemical doping that uses CMOS-compatible processes

DWPI Title: Doping substrate from dopant precursor gas involves covering surface of substrate with hard mask, selectively removing material from hard mask such that selected areas of substrate surface are laid bare, and exposing laid-bare areas to the dopant precursor gas
Abstract: A method of Atomic Precision Advanced Manufacturing (APAM) is provided, in which a substrate is doped from a dopant precursor gas. The method involves covering a surface of the substrate with a hard mask, selectively removing material from the hard mask such that selected areas of the substrate surface are laid bare, exposing the laid-bare areas to the dopant precursor gas, and heating the substrate so as to incorporate dopant from the dopant precursor gas into the substrate surface.
Use: Method for doping a substrate from a dopant precursor gas.
Advantage: The method is highly scalable and can leverage standard CMOS process to enable patterning of an APAM device.
Novelty: Doping a substrate from a dopant precursor gas involves covering a surface of the substrate with a hard mask; selectively removing material from the hard mask such that selected areas of the substrate surface are laid bare; exposing the laid-bare areas to the dopant precursor gas; heating the substrate to incorporate dopant from the dopant precursor gas into the substrate surface; forming a locking layer over the substrate surface by deposition followed by recrystallization; and epitaxially growing a cap layer of silicon over the substrate.
Filed: 6/28/2021
Application Number: US17360284A
Tech ID: SD 15214.1
This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.
Data from Derwent World Patents Index, provided by Clarivate
All rights reserved. Republication or redistribution of Clarivate content, including by framing or similar means, is prohibited without the prior written consent of Clarivate. Clarivate and its logo, as well as all other trademarks used herein are trademarks of their respective owners and used under license.