Gas delivery system for environmental transmission electron microscope

DWPI Title: Gas delivery system for providing precisely controlled gas flow to environmental transmission electron microscope (ETEM), has process gas outlet connected to each of low volume gas injection chambers for delivering process gas from low volume gas injection chamber to feed point of instrument
Abstract: A portable, compact gas delivery system can support an environmental transmission electron microscope. Environment transmission electron microscopy provides researchers a unique capability of assessing a material's surface conditions at atomic resolution in a variety of reactive and oxidizing environments. The ability to precisely control the analysis chamber's environmental conditions over time is key to the success of a typical surface analysis. The gas delivery system provides the correct balance or pressure delivery precision, contamination control, and gas isolation.
Use: Gas delivery system for providing precisely controlled gas flow to an environmental transmission electron microscope (ETEM).
Advantage: The gas delivery system can provide a precisely controlled gas flow to an environmental transmission electron microscope (ETEM). It provides a control methodology to deliver a large variety of pure gases under highly dynamic pressure and flow requirements to, e.g. an ETEM in a small, yet portable, footprint. It can rapidly change gas concentrations to ETEM's process gas feed point in preparation for a variety of experimental conditions. It minimizes vibration transmission by using a differentially pumped gas feedline configuration. It not only can support ETEM applications, but it is universal enough to address a wide variety of other laboratory experimental equipment needs at low cost and with great flexibility.
Novelty: Gas delivery system comprises one or more process gas inlets, each of which supplies a process gas, an electronic pressure controller for controlling the pressure of the process gas delivered from each of the one or more process gas inlets to one or more low volume gas injection chambers, a vibration-isolating coaxial gas feedline fluidically connecting each of the one or more process gas inlets to each of the one or more low volume injection chambers, where each coaxial gas feedline comprises an inner primary tube for flow of the process gas therein, and a coaxial outer secondary tube providing an annular permeation barrier space between the inner primary tube and the outer secondary tube that is differentially pumped to remove contaminants, and a process gas outlet connected to each of the one or more low volume gas injection chambers for delivering the process gas from the low volume gas injection chamber to a feed point of an instrument.
Filed: 11/25/2020
Application Number: US17104299A
Tech ID: SD 15058.1
This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.
Data from Derwent World Patents Index, provided by Clarivate
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