Reactive ion etched substrates and methods of making and using

Patent Number: 7,253,008
Issued: 8/7/2007
Official Filing: View the Complete Patent
Abstract: Disclosed herein are substrates comprising reactive ion etched surfaces and specific binding agents immobilized thereon. The substrates may be used in methods and devices for assaying or isolating analytes in a sample. Also disclosed are methods of making the reactive ion etched surfaces.
Filed: 12/28/2004
Application Number: 11/22,862
Government Interests: STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.