Reactive ion etched substrates and methods of making and using
| Patent Number: | 7,253,008 |
| Issued: | 8/7/2007 |
| Official Filing: | View the Complete Patent |
| Abstract: | Disclosed herein are substrates comprising reactive ion etched surfaces and specific binding agents immobilized thereon. The substrates may be used in methods and devices for assaying or isolating analytes in a sample. Also disclosed are methods of making the reactive ion etched surfaces. |
| Filed: | 12/28/2004 |
| Application Number: | 11/22,862 |
| Government Interests: | STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |