Process for manufacture of semipermeable silicon nitride membranes

Patent Number: 6,660,648
Issued: 12/9/2003
Official Filing: View the Complete Patent
Abstract: A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.
Filed: 10/2/2000
Application Number: 9/678,418
Government Interests: STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.