Process for manufacture of semipermeable silicon nitride membranes
Patent Number: | 6,660,648 |
Issued: | 12/9/2003 |
Official Filing: | View the Complete Patent |
Abstract: | A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques. |
Filed: | 10/2/2000 |
Application Number: | 9/678,418 |
Government Interests: | STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |