Preparation of asymmetric porous materials

Patent Number: 10,610,822
Issued: 4/7/2020
Official Filing: View the Complete Patent
Abstract: As asymmetric porous film structure formed by depositing a porous material film on a flexible substrate, and applying an anisotropic stress to the porous media on the flexible substrate, where the anisotropic stress results from a stress such as an applied mechanical force, a thermal gradient, and an applied voltage, to form an asymmetric porous material.
Filed: 3/25/2015
Application Number: 14/667,749
Government Interests: STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention.