| Abstract: A polymeric matrix material exhibits low loss at optical frequencies and
facilitates the fabrication of all-dielectric metamaterials. The low-loss
polymeric matrix material can be synthesized by providing an unsaturated
polymer, comprising double or triple bonds; partially hydrogenating the
unsaturated polymer; depositing a film of the partially hydrogenated
polymer and a crosslinker on a substrate; and photopatterning the film by
exposing the film to ultraviolet light through a patterning mask, thereby
cross-linking at least some of the remaining unsaturated groups of the
partially hydrogenated polymer in the exposed portions. |
| Filed: 11/29/2011 |
| Application Number: 13/305837 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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