| Abstract: | A method of electroless atomic layer deposition is described. The method
electrolessly generates a layer of sacrificial material on a surface of a
first material. The method adds doses of a solution of a second material
to the substrate. The method performs a galvanic exchange reaction to
oxidize away the layer of the sacrificial material and deposit a layer of
the second material on the surface of the first material. The method can
be repeated for a plurality of iterations in order to deposit a desired
thickness of the second material on the surface of the first material. |