| Abstract: A method for forming a surface-textured single-crystal film layer by
growing the film atop a layer of microparticles on a substrate and
subsequently selectively etching away the microparticles to release the
surface-textured single-crystal film layer from the substrate. This
method is applicable to a very wide variety of substrates and films. In
some embodiments, the film is an epitaxial film that has been grown in
crystallographic alignment with respect to a crystalline substrate. |
| Filed: 5/23/2011 |
| Application Number: 13/113123 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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