| Abstract: Novel photo-writable and thermally switchable polymeric materials exhibit
a refractive index change of .DELTA.n.gtoreq.1.0 when exposed to UV light
or heat. For example, lithography can be used to convert a non-conjugated
precursor polymer to a conjugated polymer having a higher
index-of-refraction. Further, two-photon lithography can be used to
pattern high-spatial frequency structures. |
| Filed: 9/4/2013 |
| Application Number: 14/18058 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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