| Abstract: | A polymeric matrix material exhibits low loss at optical frequencies and
facilitates the fabrication of all-dielectric metamaterials. The low-loss
polymeric matrix material can be synthesized by providing an unsaturated
polymer, comprising double or triple bonds; partially hydrogenating the
unsaturated polymer; depositing a film of the partially hydrogenated
polymer and a crosslinker on a substrate; and photopatterning the film by
exposing the film to ultraviolet light through a patterning mask, thereby
cross-linking at least some of the remaining unsaturated groups of the
partially hydrogenated polymer in the exposed portions. |