| Abstract: Micron-size and sub-micron-size patterns on a substrate can direct the
self-assembly of surface-bonded mixed polymer brushes to create nanoscale
patterns in the phase-separated mixed polymer brush. The larger scale
features, or patterns, can be defined by a variety of lithographic
techniques, as well as other physical and chemical processes including
but not limited to etching, grinding, and polishing. The polymer brushes
preferably comprise vinyl polymers, such as polystyrene and poly(methyl
methacrylate). |
| Filed: 1/30/2012 |
| Application Number: 13/361228 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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