| Abstract: Methods are described for making nanostructures that are mechanically,
chemically and thermally stable at desired elevated temperatures, from
nanostructure templates having a stability temperature that is less than
the desired elevated temperature. The methods comprise depositing by
atomic layer deposition (ALD) structural layers that are stable at the
desired elevated temperatures, onto a template employing a graded
temperature deposition scheme. At least one structural layer is deposited
at an initial temperature that is less than or equal to the stability
temperature of the template, and subsequent depositions made at
incrementally increased deposition temperatures until the desired
elevated temperature stability is achieved. Nanostructure templates
include three dimensional (3D) polymeric templates having features on the
order of 100 nm fabricated by proximity field nanopatterning (PnP)
methods. |
| Filed: 10/16/2007 |
| Application Number: 11/872749 |
| This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear Security Administration. The Government has certain rights in the invention. |
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