Process for manufacture of semipermeable silicon nitride membranes

United States Patent

6,660,648
December 9, 2003
View the Complete Patent at the US Patent & Trademark Office
Semipermeable Membranes for Micromachined Silicon Surfaces
A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.
Galambos; Paul Charles (Albuquerque, NM), Shul; Randy J. (Albuquerque, NM), Willison; Christi Gober (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
09/678,418
October 2, 2000
438/714 ; 438/724;
H01L 21/02 (20060101); H01L 21/302 (20060101); H01L 021/302 ();
438/706,714,719,723,724
GOVERNMENT RIGHTS This invention was made with Government support under Contract DE-AC04-94AL85000 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.